Non-Graded Base Si/Ge Heterojunction Transistor
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https://nepp.nasa.gov/DocUploads/0624ECCF-180F4C0AA 3ACF526CFFBCD6 6/pub_hbt_paper.pdf
http://www.wiasberlin.de/people/glitzky/HTML/project2.html
Sam Mil'shtein, Samed Halilov, John Palma, "SiGe HBT with Quantum Well Base", Intern. Confer, Phys. Semicond.-2014, p. 15, Aug. 2014
http://www.microwavejournal.com/articles/2659-sige-transistor-technology-for-rf-applications
http://www.ioffe.ru/SVA/NSM/Semicond/
Adel S. Sedra et al., “Microelectronic Circuits – Theory and Applications”, Oxford University Press, P.159 to P.298.
http://www.keysight.com/upload/cmc_upload/All/Maury-WebEx-NewUltra-FastNoiseParameterSystem. pdf?&cc=US&lc=eng
Donald A. Neamen, “Semiconductor Physics and Devices- Basic Principles”, Mcgraw Hill Companies Inc, P.491 to P.558
http://www.antenna-theory.com/definitions/sparameters.php
R. Szweda, “Silicon Germanium Materials and Devices - A Market and Technology Overview to 2006”, Elsevier Science
D. C. Ahlgren, M. Gilbert, D. Greenberg, S. J. Jeng, J. Malinowski, D. Nguyen-Ngoc, K. Schonenberg, K. Stein, R. Groves, K. Walter, G. Hueckel, D. Colavito, G. Freeman, D. Sunderland, D. L. Harame, and B. Meyersori, IBM Microelectronics Division, Hopewell Junction, New York. *IBM Research Division, Yorktown Heights, New York. “Manufacturability Demonstration of an Integrated SiGe HBT Technology for the Analog and Wireless Marketplace”, Electron Devices Meeting, 1996. IEDM '96., International
Harame. K. Schonenberg, M. Gilbert, et al., IBM Res. Div., Yorktown Hts., NY, USA, *IBM Microelectronics Division, Ifopewell Junct., NY, EE Dept Auburn IJniv., Auburn, AL, Analog Devices, Greensboro, NC, Analog Devices, Wilmington, MA, “A 200 mm SiGe-HBT technology for wireless and mixed-signal applications”, 1994 IEEE International Electron Devices Meeting.
Jing Zhang, Yonghui Yang, Guangbing Chen, Yuxin Wang, Dongbing Hu, Kaizhou Tan, Wei Cui, Zhaohuan Tang, National Laboratory of Analog Integrated Circuits, Chongqing, China, “A Ge-Graded SiGe HBT with β > 100 and fT = 67 GHz”, World Journal of Engineering and Technology, 2015.
J.V. Grahn*, H. Fosshaug, M. Jargelius, P. JoÈ nsson, M. Linder, B.G. Malm, B. Mohadjeri, J. Pejnefors, H.H. Radamson, M. SandeÂn, Y.-B. Wang, G.Landgren, M. Ostling, “A low-complexity 62-GHz fT SiGe heterojunction bipolar transistor process using dierential epitaxy and in situ phosphorus-doped poly-Si emitte emitter at very low thermal budget”, Solid-State Electronics 44 (2000) 549-554.
DOI: https://doi.org/10.18686/esta.v6i1.70
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